| 摘要 |
PROBLEM TO BE SOLVED: To miniaturize and simplify a system while holding the plotting accuracy by forming, contracting, projecting, and deflecting an electron beam, and making each component of an electro-optical system plotting on a sample an electrostatic system. SOLUTION: A first forming aperture 4, an electrostatic lighting lens 20, a first electrostatic forming deflecting device 21, a second forming aperture 7, a second electrostatic forming deflecting device 21, a third aperture 23, an electrostatic contraction lens 24, an electrostatic main deflecting objective lens 25, and an electron detector 12 are arranged on the optical axis of an electron gun 1 of an electron beam plotter device. An electron beam 2 formed into a desired aperture image is radiated so as to form a pattern. Common use of an electrostatic lens or an each component of the electro-optical system and a shield electrode used as an electrostatic deflecting device for an adjoining electrostatic lens and the electrostatic deflecting device can shorten the length of the whole electro-optical system and provide a small-size electron beam plotter device.
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