| 摘要 |
PROBLEM TO BE SOLVED: To provide a low pressure CVD system with a cleaning mechanism which has an increased cleaning efficiency by uniformizing the flow of a cleaning gas. SOLUTION: This vertical CVD system is provided with a boat for supporting a plurality of wafers, an inner tube, an outer tube, a reaction gas supply nozzle installed between the inner wall surface of the inner tube and the boat, and a cleaning nozzle 21 also installed between the inner wall surface of the inner tube and the boat. The cleaning nozzle has a vertical tube section 21b installed along the inner tube. The vertical tube section 21b has blowout ports for a cleaning gas which are a blowout port 12a opening upwards, a blowout port 12b facing the center of a furnace, and blowout ports 12c, 12d facing to the right and the left along the inner surface of the furnace.
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