发明名称 Particle deposition apparatus
摘要 An electrostatic chuck 910 has a conductive layer 920, with a dielectric layer 930 on top of it. An upper conductive layer 940 may protrude outward form the dielectric layer, or may be embossed into it. The chuck is used for electrostatically attracting charged particles, which are supplied from a dispenser adjacent to the chuck. A sensor (not shown) measures the amount of charged particles adhering to the chuck. The chuck is used to deposit particles of a pharmaceutical onto a substrate, the substrate being attached to the chuck.
申请公布号 NZ332222(A) 申请公布日期 2000.06.23
申请号 NZ19970332222 申请日期 1997.04.09
申请人 DELSYS PHARMACEUTICAL CORPORATION 发明人 SUN, HOI CHEONG STEVE;PLETCHER, TIMOTHY ALLEN
分类号 A61K9/20;A61K9/28;B05B5/08;H02N13/00;(IPC1-7):H02N13/00;B05D1/04;B05C13/00 主分类号 A61K9/20
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