发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having high-performance circuits which are formed with TFT's exhibiting small variations in characteristics. SOLUTION: An undercoat 11 and a semiconductor film 12 are formed on a quartz substrate 10 successively without exposing then the air. After crystallizing the semiconductor film by using a catalytic element, the catalytic element is removed. A TFT formed in such a process exhibits extremely small variations in electrical properties such as threshold voltage and sub-threshold coefficient. Accordingly, a circuit susceptible to variations in characteristics of the TFT such as differential amplifier circuit can be formed.
申请公布号 JP2000174282(A) 申请公布日期 2000.06.23
申请号 JP19980344230 申请日期 1998.12.03
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 OTANI HISASHI;KOYAMA JUN;YAMAZAKI SHUNPEI
分类号 H01L27/08;G02B27/01;G02F1/1362;H01L21/336;H01L21/77;H01L21/8242;H01L21/8244;H01L21/84;H01L27/108;H01L27/11;H01L27/12;H01L29/04;H01L29/786 主分类号 H01L27/08
代理机构 代理人
主权项
地址