发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device having high-performance circuits which are formed with TFT's exhibiting small variations in characteristics. SOLUTION: An undercoat 11 and a semiconductor film 12 are formed on a quartz substrate 10 successively without exposing then the air. After crystallizing the semiconductor film by using a catalytic element, the catalytic element is removed. A TFT formed in such a process exhibits extremely small variations in electrical properties such as threshold voltage and sub-threshold coefficient. Accordingly, a circuit susceptible to variations in characteristics of the TFT such as differential amplifier circuit can be formed. |
申请公布号 |
JP2000174282(A) |
申请公布日期 |
2000.06.23 |
申请号 |
JP19980344230 |
申请日期 |
1998.12.03 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
OTANI HISASHI;KOYAMA JUN;YAMAZAKI SHUNPEI |
分类号 |
H01L27/08;G02B27/01;G02F1/1362;H01L21/336;H01L21/77;H01L21/8242;H01L21/8244;H01L21/84;H01L27/108;H01L27/11;H01L27/12;H01L29/04;H01L29/786 |
主分类号 |
H01L27/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|