| 摘要 |
<p>An EUV illumination system comprises an EUV radiation source unit (1) and at least one EUV radiation-reflecting mirror (10), which mirror comprises a multilayer structure of first layers (12) of a first material alternating with second layers (13) of a second material, and which radiation source unit comprises an electron source (2) for supplying an electron beam (EB) and a medium (3) which converts the electron beam into a beam of photons (IB). As the medium (3) comprises at least one material that is equal to one of the materials of the mirror multilayer structure, the photon beam (IB) has a relatively large intensity.</p> |
