DISTRIBUTED CONTROL SYSTEM ARCHITECTURE AND METHOD FOR A MATERIAL TRANSPORT SYSTEM

摘要

There is provided a chemical vapor deposition apparatus for depositing substantially uniform films or layers onto a substrate or wafer. The apparat us includes a chamber with an injector assembly including spaced linear injecto rs and a chemical vapor delivery system for delivering chemicals to said injectors to form spaced adjacent deposition regions. Translation means reciprocally move said substrate or wafer a predetermiend distance in a direction perpendicular to the long axis of the linear injectors while maintaing the substrate surface parallel and adjacent to the chemical delive ry surface of the linear injector assembly whereby the deposition regions of adjacent injectors merge to form a film or layer of substantially uniform thickness.