| 摘要 |
<p>Bottom antireflection layer comprises at least one metal oxide, especially TiO2, SnO2, Ta2O5, ZnO and Nb2O5. Top antireflection layer comprises AlN and/or Si3N4. A 0.1-1 (preferably 0.2-0.5) nm thick metal or sub-nitride layer (preferably Ti, Zr, Al, Cr, Ni or Hf, or their mixtures, or their sub-nitrides) is located between the silver layer and the top antireflection layer, to promote adhesion. The system preferably includes two silver layers separated by a dielectric antireflection layer formed from a metal oxide corresponding to the bottom antireflection layer, and a 1-2 nm metallic blocking layer is applied below the metal oxide layer directly on the silver layer. The system of layers is preferably as follows: substrate - 25 to 35 nm TiO2 - 8 to 12 nm Ag - 1 to 2 nm Ti - 50 to 60 nm TiO2 - 8 to 12 nm Ag - 0.1-0.5 nm Ti - 35-45 nm AlN. Independent claims are given for: (a) a system of layers of a heat reflecting system for transparent substrates as above except that the bottom antireflection layer comprises metal oxides other than ZnO, such as TiO2, SnO2, ZnO, Ta2O5 or Nb2O5 and a top 5-15 nm thick ZnO part that is next to the silver layer; (b) a flexible polymeric film on at least one face of which is applied the system of layers cited above; and (c) laminated glass incorporating the polymer film cited in (b).</p> |
