PRODUCTION OF SPUTTERING TARGET FOR FORMING OPTICAL DISK PROTECTIVE FILM

摘要

PROBLEM TO BE SOLVED: To obtain a target in which particles generated at the time of forming a film by sputtering are reduced and suitable for the formation of a dielectric protective film of an optical disk. SOLUTION: This is a sputtering target for forming a ZnS-SiO2 optical disk protective film in which 0.1 to 10% α phase as a high temp. phase is allowed to contain in the crystal phase of the target, and by executing sintering at >=1000 deg.C by not pressing or the like or executing heat treatment at a high temp. of >=1000 deg.C after sintering at a low temp., the α phase as a high temp. phase is formed in the crystal phase.