| 摘要 |
PROBLEM TO BE SOLVED: To obtain a target with improved the uniformity of an Al alloy reflective film formed by sputtering and improved optical function by allowing it to have specified crystal grain size and preventing the formation of intermetallic compd. phases therein. SOLUTION: As to this invention, the crystal grain size is <=30μm. Preferably, it is an Al-Ti alloy contg. 0.1 to 5 at% Ti and is a sputtering target for forming a reflective film for an optical disk in which the growth of grains is suppressed by executing sintering using HIP or hot pressing. When sputtering is executed by using the target of an Al alloy sintered body having <=30μm crystal grain size, optical function suitable for a reflective film for an optical disk is sufficiently imparted. Moreover, a reflective film having moisture resistance, function of preventing deformation caused by heat and having resistance to thermal stress and a secular change caused by repeated temp. raising and cooling can be formed. Compared to the case in which an Al-Ti alloy target by a melting method is used, a film excellent in uniformity and good in quality can stably be produced with high reproducibility.
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