发明名称 METHOD FOR PRODUCING PHOTOCATALYST SUPPORTING STRUCTURE AND PHOTOCATALYST SUPPORTING STRUCTURE OBTAINED THEREBY
摘要 PROBLEM TO BE SOLVED: To obtain a photocatalyst supporting structure which supports a photocatalyst on the surface of a base material and at the same time exhibits intensified photocatalytic function, by applying a photocatalyst coating solution on the surface of the polymer base material followed by heat drying. SOLUTION: A photocatalyst coating liquid containing a photocatalyst such as titanium oxide and a silicon compound is applied on a base material consisting of a polymer resin, e.g. vinyl chloride resin to form a photocatalyst layer, and the layer was heated and dried at a temperature of 30 deg.C or higher and lower than 160 deg.C to allow the photocatalyst to be supported on the surface of the base material. Further, the photocatalyst layer was subjected to a reheating treatment at a temperature higher than the above drying temperature and at 800 deg.C or lower, preferably 150-800 deg.C, more preferably 300-600 deg.C for the length of time in which the base material does not deformed by blowing hot air on the photocatalyst, and then the photocatalyst layer is pressed onto the base material to obtain the objective photocatalyst supporting structure.
申请公布号 JP2000170078(A) 申请公布日期 2000.06.20
申请号 JP19980348157 申请日期 1998.12.08
申请人 NIPPON SODA CO LTD;TAIYO KOGYO CORP 发明人 YOSHIMOTO TETSUO;ABE SHINJI;KAWAMURA TORU;TOYODA HIROSHI;HATAKEYAMA TAKAHIRO
分类号 B32B27/04;B01J35/02;B01J35/06;D06M11/00;D06M11/46;D06M13/51;D06M13/513;D06M15/643;(IPC1-7):D06M15/643 主分类号 B32B27/04
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