发明名称 |
Silicon microlens cleaning system |
摘要 |
A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.
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申请公布号 |
US6077417(A) |
申请公布日期 |
2000.06.20 |
申请号 |
US19980195843 |
申请日期 |
1998.11.19 |
申请人 |
ETEC SYSTEMS, INC. |
发明人 |
LEE, KIM Y.;CHANG, T. H. PHILIP;KIM, HO-SEOB |
分类号 |
G01N;G01N13/12;G01N30/00;G12B21/00;H01J37/12;H01J37/26;(IPC1-7):H01J37/26 |
主分类号 |
G01N |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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