发明名称 Silicon microlens cleaning system
摘要 A method and system for cleaning the silicon microlenses in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.
申请公布号 US6077417(A) 申请公布日期 2000.06.20
申请号 US19980195843 申请日期 1998.11.19
申请人 ETEC SYSTEMS, INC. 发明人 LEE, KIM Y.;CHANG, T. H. PHILIP;KIM, HO-SEOB
分类号 G01N;G01N13/12;G01N30/00;G12B21/00;H01J37/12;H01J37/26;(IPC1-7):H01J37/26 主分类号 G01N
代理机构 代理人
主权项
地址