发明名称 RESIN COMPOSITION CONTAINING AMPHOTERIC ION GROUP, AND WATER-BASE INK
摘要 <p>PROBLEM TO BE SOLVED: To obtain a resin composition which is excellent in water solubility and film-forming properties and gives a coating film little in stickiness by reacting a free-radical polymerization product having cationizable amino groups with a halogenated carboxylic acid compound in the presence of a base to form amphoteric ion groups. SOLUTION: A free-radical polymerization product having cationizable amino groups [e.g. poly(N,N-dimethylaminopropylacrylamide) obtained by polymerizing N,N-dimethylaminopropylacrylamide in the presence of azobisisobutyronitrile] is reacted with a halogenated carboxylic acid compound represented by formula I and/or formula II in the presence of a base to form amphoteric ion groups represented by formula III and/or formula IV. In the formulas, n is 2 or more but preferably 20 or less; m is 1 or more but preferably 20 or less; and X is a halogen. The water-base ink containing this composition is excellent in gloss and fixability.</p>
申请公布号 JP2000169733(A) 申请公布日期 2000.06.20
申请号 JP19980344570 申请日期 1998.12.03
申请人 MINOLTA CO LTD 发明人 NOZAKI CHIYOJI;IZUMITANI SATORU
分类号 C08L101/02;C08F8/00;C09D11/023;C09D11/033;C09D11/037;C09D11/10;C09D11/106;C09D11/108;(IPC1-7):C08L101/02 主分类号 C08L101/02
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