发明名称 EMBROIDERY DATA PREPARATION METHOD FOR APPLIQUE
摘要 PROBLEM TO BE SOLVED: To manufacture an applique with an excellent appearance by almost overlapping a stitch for decoration on the stitch for stop sewing and making them be in order. SOLUTION: The contour data of a fabric piece 2 are inputted. On the basis of the contour data, stop sewing data for forming a V stitch 3 and decoration sewing data for forming a zigzag stitch 4 are prepared. In this case, in order to almost overlap the zigzag stitch 4 on the V stitch 3, the size of the V stitch 3 is set slightly smaller than the zigzag stitch 4, the start point and advancing direction of the V stitch 3 are set the same as the zigzag switch 4 and the pitch of the V stitch 3 is set to the integral multiple of the zigzag stitch 4.
申请公布号 JP2000167277(A) 申请公布日期 2000.06.20
申请号 JP19980375171 申请日期 1998.12.10
申请人 BARUDAN CO LTD 发明人 NIWA TOSHIYA
分类号 D05B19/02;D05C5/06;(IPC1-7):D05B19/02 主分类号 D05B19/02
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