发明名称 |
INK JET HEAD AND LIQUID CHAMBER SUBSTRATE THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To reduce the quantity of material required for forming a liquid chamber and to form a small liquid chamber by forming a common liquid chamber and a pressure liquid chamber of same material in two layer structure. SOLUTION: A liquid chamber substrate 21 has a first liquid chamber 22 (common liquid chamber) formed in the first surface of a single crystal Si by etching, and a second liquid chamber 25 formed in the second surface opposite to the first surface by etching wherein the second liquid chamber 25 (pressure liquid chamber) communicates with the first liquid chamber 22 through a first through hole 23. The second liquid chamber 25 also communicates with the first surface of the single crystal Si through a second through hole 24. The first through hole supplies ink from the common liquid chamber 22 to the pressure liquid chamber 25 and the second through hole ejects ink pressurized in the pressure liquid chamber 25 through a nozzle.
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申请公布号 |
JP2000168076(A) |
申请公布日期 |
2000.06.20 |
申请号 |
JP19980346387 |
申请日期 |
1998.12.07 |
申请人 |
RICOH CO LTD |
发明人 |
OTAKA KOICHI;KATO SEIICHI |
分类号 |
B41J2/045;B41J2/055;B41J2/14;B41J2/16;(IPC1-7):B41J2/045 |
主分类号 |
B41J2/045 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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