发明名称 Printing apparatus and method of making mask pattern for exposure thereby
摘要 There are provided a printing apparatus and a method of making a mask pattern for exposure by the use of the printing apparatus. A temperature of a thermal head is detected, and a plurality of split pulses formed by dividing a strobe pulse applied to the thermal head are sequentially applied with quiescent periods interposed therebetween. There is stored in advance pulse-applying data of settings of a cumulative period of pulse-applying periods over which the plurality of split pulses are respectively applied, a number of the split pulses, the split pulse-applying periods, and the quiescent periods, defined in a manner corresponding to values of the temperature of the thermal head. Appropriate pulse-applying data is read out according to the temperature detected, and application of the split pulses is controlled according to the appropriate pulse-applying data. In another form, the split pulses are controlled in a manner such that the cumulative period of the split pulse-applying periods is sufficient for a time period over which the strobe pulse is required to be applied.
申请公布号 US6076981(A) 申请公布日期 2000.06.20
申请号 US19970976915 申请日期 1997.11.24
申请人 SEIKO EPSON CORPORATION;KING JIM CO., LTD. 发明人 HAYAMA, HITOSHI;YANAGISAWA, YOSHIYUKI;WATANABE, KENJI;KAMEDA, TAKANOBU;SHIMMURA, TOMOYUKI
分类号 B41C1/04;B41J2/365;B41J33/36;(IPC1-7):B41J2/315 主分类号 B41C1/04
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