发明名称 |
Printing apparatus and method of making mask pattern for exposure thereby |
摘要 |
There are provided a printing apparatus and a method of making a mask pattern for exposure by the use of the printing apparatus. A temperature of a thermal head is detected, and a plurality of split pulses formed by dividing a strobe pulse applied to the thermal head are sequentially applied with quiescent periods interposed therebetween. There is stored in advance pulse-applying data of settings of a cumulative period of pulse-applying periods over which the plurality of split pulses are respectively applied, a number of the split pulses, the split pulse-applying periods, and the quiescent periods, defined in a manner corresponding to values of the temperature of the thermal head. Appropriate pulse-applying data is read out according to the temperature detected, and application of the split pulses is controlled according to the appropriate pulse-applying data. In another form, the split pulses are controlled in a manner such that the cumulative period of the split pulse-applying periods is sufficient for a time period over which the strobe pulse is required to be applied.
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申请公布号 |
US6076981(A) |
申请公布日期 |
2000.06.20 |
申请号 |
US19970976915 |
申请日期 |
1997.11.24 |
申请人 |
SEIKO EPSON CORPORATION;KING JIM CO., LTD. |
发明人 |
HAYAMA, HITOSHI;YANAGISAWA, YOSHIYUKI;WATANABE, KENJI;KAMEDA, TAKANOBU;SHIMMURA, TOMOYUKI |
分类号 |
B41C1/04;B41J2/365;B41J33/36;(IPC1-7):B41J2/315 |
主分类号 |
B41C1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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