发明名称 |
Silisiummateriale med strukturert oksygendoping, dets fremstilling og anvendelse |
摘要 |
<p>Silicon has a total oxygen content of 8 x 10<17> - 1 x 10<19> atom/cm<3> and a density on displacement of 1 x 10<5> - 5 x 10<7> cm<-2>. An Independent claim is also included for a process for the production of the silicon comprising saturating molten silicon in contact with silicon monoxide and/or silicon dioxide with oxygen and/or treating the silicon melt before or during crystallization. The density can be adjusted via the cooling speed of the silicon.</p> |
申请公布号 |
NO20003125(D0) |
申请公布日期 |
2000.06.16 |
申请号 |
NO20000003125 |
申请日期 |
2000.06.16 |
申请人 |
BAYER AG |
发明人 |
HOSSLER, CHRISTIAN;HOEFS, HANS-ULRICH;KOCH, WOLFGANG;THURM, SIEGFRIED;BREITENSTEIN, OTWIN |
分类号 |
C01B33/02;C30B15/00;C30B15/34;C30B29/16;C30B29/64;H01L21/208;H01L31/04;(IPC1-7):H01L |
主分类号 |
C01B33/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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