| 摘要 |
PROBLEM TO BE SOLVED: To carry out continuous formation of an underlayer, a magnetic layer and the protective layer by arranging sputtering chambers and the ECR(electron cyclotron resonance)-CVD chamber as well as to form a uniform thin superior protective layer in an ECR-CVD chamber. SOLUTION: A heater 11, sputtering chambers 12, 13 and an ECR-CVD chamber 14 are arranged and a glass substrate 21 is successively fed to these chambers to carry out heating and formation of an underlayer, a magnetic layer and a protective layer. In the ECR-CVD chamber 14, only the glass substrate 21 is kept under negative potential and a thin uniform DLC(diamond-like carbon) film excellent in corrosion and wear resistances is tightly and firmly formed on only the surface of the glass substrate 21. The reaction chamber is kept under ground potential, and even when a film forming material deposits on the inner wall, it sticks in a soft state and is prevented from peeling.
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