| 摘要 |
PROBLEM TO BE SOLVED: To obtain a plasma treatment apparatus, capable of forming preferably a functional deposited film useful for an electrophotographic photosensitive device, an image input line sensor, etc. SOLUTION: A plasma treatment apparatus or method, comprising a plasma generating high-frequency electrode and a high-frequency power supply 105 for applying high-frequency power to the electrode, generates plasma, by supplying high-frequency power from the high-frequency power supply 105 to the plasma generating high-frequency electrode and forms a deposited film on a base body 102 by decomposing a raw material gas supplied into a reaction vessel 100. On the opposite side of a high-frequency power feeding point of the plasma generating high-frequency electrode are provided a matching circuit 106 grounded via a variable high-voltage capacitor and a phase control circuit having variable high-voltage vacuum capacitor disposed between this matching circuit 106 and the high-frequency electrode, and the capacitance of both capacitors in the matching circuit 106 and the phase control circuit are controlled respectively, so that the total amount of the capacitance of both capacitors can be controlled variably in a definite range. |
