发明名称 DEFECT INSPECTING DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To automatically discriminate a foreign matter from a scratch. SOLUTION: This device 10 is provided with a vertical light emitting device 20 for emitting a vertical light 21 to the surface to be inspected 2 of a wafer 1; an oblique light emitting device 24 for emitting an oblique light 28 to the surface to be inspected; a high angle light receiving device 30 for receiving a high angle light 31 of the scattered light irregularly reflected by the surface to be inspected 2; a middle angle light receiving device 40 for receiving a middle angle light 41; and a low angle light receiving device 50 for receiving a low angle light 51. Of the scattered light in the scanning emission of the vertical light 21 to the surface to be inspected 2, the high angle light 41 and the middle angle light 41 are collected by the high angle light receiving device 30 and the middle angle light receiving device 40, and the low angle light 51 in the scanning emission of the oblique light 28 to the surface to be inspected 2 is collected by the low angle light receiving device. When the low angle light is eliminated from the high angle light and middle angle light, a scratch is discriminated from a foreign matter. By this automatic discrimination, the working property, quality and reliability of the defect inspection can be improved.
申请公布号 JP2000162141(A) 申请公布日期 2000.06.16
申请号 JP19980337002 申请日期 1998.11.27
申请人 HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD 发明人 MORIYAMA ICHIRO;TANABE YOSHIKAZU;KENBO YUKIO;NOGUCHI MINORU;OSHIMA YOSHIMASA;ISHIMARU ICHIRO;HACHIKAKE YASUO;KATO YUICHIRO
分类号 H01L21/306;G01N21/88;G01N21/93;G01N21/94;G01N21/956;H01L21/66;(IPC1-7):G01N21/88 主分类号 H01L21/306
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