| 摘要 |
PROBLEM TO BE SOLVED: To obtain a substrate processing device and substrate processing method, which can increase an ozone concentration in ozone water to be supplied to a substrate, and positively eliminate organic matters, metal contaminants, or the like adhered to a surface of the substrate. SOLUTION: After pure water led from a pure water introduction part 4 into a circulation passage 2 is cooled by a cooling part 25, e.g. at 15 deg.C or below, it is mixed with ozone led into a mixing part 33 to form ozone water having an ozone concentration, e.g. 25 ppm or above. The formed ozone water is supplied to a cleaning bath 12 and stored therein. A plurality of substrates W are dipped in ozone water 11 stored in the cleaning bath 12, and also ultrasonic vibrations are given to the ozone water 11 by an ultrasonic generator 15 to clean a substrate W. Furthermore, the cooling part 25 is controlled by a control part 6, based on a temperature signal ST or a concentration signal SD transmitted from a temperature sensor 17 or a concentration measuring part 26, respectively.
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