| 摘要 |
PROBLEM TO BE SOLVED: To obtain a microwave plasma processor for operating uniform plasma processing to continuously supplied plural objects to be processed. SOLUTION: A microwave plasma processor is provided with a plasma generation furnace 10 for turning a treated gas G into plasma, a plasma processing chamber 8 for operating prescribed plasma processing to an object 20 to be processed by using the treated gas G turned into plasma which is generated by the plasma generation furnace 10, a first preliminary chamber 31 and a second preliminary chamber 32 arranged so as to be made adjacent to the plasma processing chamber 8 for holding constant the inside state of the plasma processing chamber 8 and for carrying in and out the object 20 to be processed for the plasma processing chamber 8, and a controller 15 for controlling the carried situation of the object 20 to be processed between the plasma processing chamber 8 and the first preliminary chamber 31 and the second preliminary chamber 32. Thus, the object to be processed is carried in and out for the plasma processing chamber, while the inside state of the plasma processing chamber is held constant via the preliminary chambers so that the plasma processing can be operated on the continuously supplied plural objects to be processed, while microwaves are made to continuously oscillate. |
