| 摘要 |
PROBLEM TO BE SOLVED: To provide a microwave plasma treating device stably converting treating gas into a plasma and capable of applying a uniform plasma treating to an object without utilizing an expensive apparatus such as an automatic tuner. SOLUTION: The insides of the plasma generating tube 23 of a plasma generating furnace 10 and a plasma treating chamber 8 are decompressed by an exhaust device 11 and a vacuum valve 12, treating gas G is introduced into a linear section 23b via the upstream nozzle section 23a of the plasma generating tube 23, and the desired plasma generating condition is formed in the linear section 23b of the plasma generating tube 23 extending in a waveguide 21. Microwaves are fed into the waveguide 21 of the plasma generating furnace 10, and the treating gas G introduced to the linear section 23b of the plasma generating tube 23 extending in the waveguide 21 is converted into a plasma by the standing waves of the microwaves formed in the waveguide 21. The treating gas G converted into a plasma is introduced into the plasma treating chamber 8 by the gas flow caused by the exhaust of the exhaust device 11 and is radiated to an object 20, thus the prescribed plasma treating is applied to the object 20. |
