METHOD FOR CLEANING SILICON SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To efficiently eliminate particles adhered to a surface of a silicon substrate. SOLUTION: A main surface of a silicon substrate 10 is set in the vertical direction, and the silicon substrate 10 is impregnated in an organic acid or organic acid salt solution 12, or a mixed solution 12 in which hydrofluoric acid is mixed with the solution. The main surface of the substrate 10 is set to the vertical direction, and the substrate 10 is pulled up from the dipped solution 12 at a rate of 5 to 50 mm/sec. When the substrate 10 is pulled up from the impregnated solution 12, the same solution as the dipped solution 12 is supplied to the surface of the substrate so that the solution film is formed on the entire surface of the substrate.