发明名称 METHOD AND APPARATUS FOR INSPECTING PLOT PATTERN
摘要 PROBLEM TO BE SOLVED: To automate inspection by recording an image of a region containing a border between adjacent fields, determining a singular figure among figures which matches a pattern image through pattern matching, and quantifying a shift from a plot position based on a differential vector between a measurement value and a set value, which exist in one and other field regions. SOLUTION: A semiconductor substrate 3 is held on a two-dimensional moving means 2 with a plot facing up in a body 11 of an inspection apparatus 1, and a SEM4 is placed facing oppositely the upper face of the substrate 3. Secondary electrons emitted from the SEM4 are stored in an image storing means 5 as images. The image storage means 5 extracts a figure which matches with a pattern image through pattern matching with comparison standards to determine singular figures. An image processing means 7 calculates a actual measured value of a figure coordinate vector, while a control arithmetic calculator 8 quantifies stitching, based on a differential vector between the actual measured value and a set value, which exist in one and other field regions where the singular figures exist.
申请公布号 JP2000161938(A) 申请公布日期 2000.06.16
申请号 JP19980331227 申请日期 1998.11.20
申请人 APPLIED MATERIALS INC 发明人 TSUNEOKA MASATOSHI
分类号 G01B11/24;G01B15/00;G06T1/00;G06T7/00;H01L21/66 主分类号 G01B11/24
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