| 摘要 |
PROBLEM TO BE SOLVED: To enable a substrate to be quickly dried out protecting it against contamination caused by turbulence without rotating it at a high speed, by a method wherein a rotator which holds the substrate is rotated to enable liquid attached to the substrate to fly away, and the substrate is irradiated with heat rays from above its upside and/or below its underside. SOLUTION: A substrate W wetted with a cleaning solution is held with a chuck 12 fixed on a rotating table 14, the upside and underside of the substrate W are irradiated with light rays emitted from light sources 22a and 22b to raise the temperature of the substrate W. At this point, the rotating table 14 is rotated at a speed of about 1000 rpm so as to restrain turbulence from occurring, and a liquid film of cleaning liquid is made to fly away from the substrate W. Then, the rotating table 14 is rotated at a speed of about 500 rpm or below irradiating the upside and underside of the substrate W with heat rays radiated from the light sources 22a and 22b, and the substrate W is raised in temperature to mainly evaporate a thin liquid film left on the surface of the substrate W.
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