发明名称 FORMING METHOD OF ELECTROLESS Ni-P PLATING LAYER ON GLASS SUBSTRATE FOR MAGNETIC DISK
摘要 PROBLEM TO BE SOLVED: To omit a polishing process before a texturing process by successively subjecting the surface of a glass substrate to degreasing treatment, etching treatment, treatment with warm pure water, treatment with a silane coupling agent, activator treatment and accelerator treatment, and then subjecting to electroless Ni-P plating and to heat treating. SOLUTION: The surface of a glass substrate is subjected to alkali degreasing treatment to remove contaminants and to acid etching to remove remaining oxide films. The purified glass substrate surface is treated with warm pure water at about >=90 deg.C to newly form an oxide film, and then treated with, for example, an amino-based silane coupling agent. Then the surface is subjected to activation (activator treatment) with, for example, a palladium chloride aq. soln., further subjected to reaction acceleration treatment (accelerator treatment) with, for example, a sodium hypophosphite aq. soln., then subjected to electroless Ni-P plating to form a Ni-P plating layer, and then subjected to specified heat treatment.
申请公布号 JP2000163743(A) 申请公布日期 2000.06.16
申请号 JP19980335229 申请日期 1998.11.26
申请人 FUJI ELECTRIC CO LTD 发明人 WATANABE NORIHISA
分类号 G11B5/84;C23C18/18;C23C18/31;C23C18/32;(IPC1-7):G11B5/84 主分类号 G11B5/84
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