发明名称 WAFER SEPARATING DEVICE AND ITS METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a wafer separating device and its method, capable of preventing contamination of a semiconductor device and damages of a semiconductor package. SOLUTION: A wafer separating method includes the steps of forming a trench 218 in a semiconductor wafer along a scribing line, placing a semiconductor wafer on a stage 310 and aligning each semiconductor device 215 to a corresponding hole fixing the semiconductor wafer to the stage 310 through the use of a vacuum, and applying mechanical force to the semiconductor wafer to cut the semiconductor wafer along the scribing line. A wafer-separating device has a top surface for mounting a wafer on a soft structure and having plural holes evacuated to a vacuum to fix the wafer, the soft structure having at least one hole aligned to the bottom of each semiconductor 215 formed on the wafer, and a pressing means for pressing and cutting the wafer along a trench 218 between the semiconductor devices.</p>
申请公布号 JP2000164534(A) 申请公布日期 2000.06.16
申请号 JP19990325929 申请日期 1999.11.16
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 JIN HO TAE;HONG IN PYO;KIN HEIBAN;HO SEIKO
分类号 H01L21/301;H01L21/00;H01L21/78;(IPC1-7):H01L21/301 主分类号 H01L21/301
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