发明名称 VAPOR TEMPERATURE CONTROL DEVICE
摘要 PROBLEM TO BE SOLVED: To ensue prevention of an increase in a pressure loss coefficient and an improvement of a control property of heating vapor temperature, by installing a plurality of stages of control gas distribution damper and full opening keeping gas distribution dampers on an overheater path and a reheater path, and controlling the full opening keeping gas distribution damper. SOLUTION: The control device is equipped with an overheater and a reheater on each path for combustion gas and a plurality of stages of gas distribution dampers and an opening of the damper is operated to adjust a combustion gas flow rate on each path for control of vapor temperatures from the overheater and the reheater. In this case, the plurality of the stages of the gas distribution damper comprises ordinary opening control gas distribution dampers 16, 17 where the opening of the damper is controlled at all times, and full open keeping gas distribution dampers 19, 20 where the opening of the damper is kept in a full open state. When there is a load change instruction or when a deviation between a vapor temperature from the overheater or the reheater exceeds a predetermined value, there is operated the full open keeping gas distribution damper 19 or 20 on a specific path in the plurality of the paths in a closing direction.
申请公布号 JP2000161607(A) 申请公布日期 2000.06.16
申请号 JP19980337681 申请日期 1998.11.27
申请人 BABCOCK HITACHI KK 发明人 UENISHI MASATO;SHIBATA KENJI
分类号 F22D5/04;(IPC1-7):F22D5/04 主分类号 F22D5/04
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