发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide the photosensitive resin composition extremely small in light scattering at the time of exposure and developable with water in a short time by using a specified polyamide resin for a filler polymer. SOLUTION: The photosensitive resin composition comprises the polyamide comprising 40-60 weight % structural units each represented by formula I and 30-50 weight % structural units each represented by formula II and 5-15 weight % structural units each represented by forming III, (thus permitting the polymerized polyamide resin to be used for the filler polymer), and further, the composition contains a monomer having a photo-polymerizable unsaturated bond and a photopolymerization initiator. In formulae I-III, R1 is a >=5C alkylene group: R2 is a 2-10C hydrocarbon group; R3 is a 1-4C alkylene group or a simple bond; R4 is a 1-4C alkylene group; R5 is a 2-10C hydrocarbon group; and each of R6 and R7 is a methylene group or a simple bond.
申请公布号 JP2000162770(A) 申请公布日期 2000.06.16
申请号 JP19990370558 申请日期 1999.12.27
申请人 TOYOBO CO LTD 发明人 OYOKU AKITADA;FUJIMURA TOSHIAKI;NANHEI MASARU
分类号 G03F7/037;G03F7/00;G03F7/027 主分类号 G03F7/037
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