发明名称 APPEARANCE INSPECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To realize an appearance inspecting device for detecting the defect of the pattern of a semiconductor wafer, having units mutually connected by an optical fiber cable. SOLUTION: This appearance inspecting device for inspecting the defect of the pattern of a semiconductor wafer 13 is provided with an image gaining means 21 for successively gaining the image of each die of the semiconductor wafer 13 having a plurality of dies; an image processing means 22 for performing a defect detecting processing to the image; and an xy-stage control means 23 for controlling an xy-stage 11 having a sample stage 12 for placing the semiconductor wafer 13. The image gaining means 21 is connected to the image processing means 22 through an optical fiber cable 41.
申请公布号 JP2000162138(A) 申请公布日期 2000.06.16
申请号 JP19980337260 申请日期 1998.11.27
申请人 TOKYO SEIMITSU CO LTD 发明人 SHINJI RYOICHI
分类号 G01N21/88;G01N21/956;(IPC1-7):G01N21/88 主分类号 G01N21/88
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