POSITIVELY PHOTOSENSITIVE RESIN COMPOSITION

摘要

A positively photosensitive resin composition which exhibits high sensitivity and a high resolving power, can form good patterns and attain a high aspect ratio and an excellent throughput in the production, and is reduced in the process dependence of dimensional accuracy. This composition comprises (i) a photosensitive novolak resin prepared either by reacting an alkali-soluble novolak resin freed from low-molecular-weight components by fractionation with an o-naphthoquinonediazide compound or by subjecting a reaction product of an alkali-soluble novolak resin with an o-naphthoquinonediazide compound to fractionation to thereby free the reaction product from low-molecular-weight components and (ii) a low-molecular compound having a phenolic hydroxyl group.