发明名称 |
METHOD FOR FABRICATING TRANSPARENT CONDUCTIVE FILM |
摘要 |
PURPOSE: A method is provided to fabricate a transparent conductive film having a good conductivity, and the fabrication cost is reduced. CONSTITUTION: A method is for fabricating a transparent conductive film by coating and annealing a transparent conductive composition material on a substrate. The material is quenched after thermal treatment. According to the method, a transparent conductive film is obtained which has an improved sheet resistance. Because the transparent conductive film maintains good sheet resistance although it is annealed at a lower temperature than the conventional annealing temperature, the energy needed in thermal treatment is reduced.
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申请公布号 |
KR20000033390(A) |
申请公布日期 |
2000.06.15 |
申请号 |
KR19980050234 |
申请日期 |
1998.11.23 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
PARK, SUNG SOON;KIM, KI YOUNG;LEE, JUNG JIN;CHUN, YOON HO |
分类号 |
H01J9/20;(IPC1-7):H01J9/20 |
主分类号 |
H01J9/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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