发明名称 METHOD FOR FABRICATING TRANSPARENT CONDUCTIVE FILM
摘要 PURPOSE: A method is provided to fabricate a transparent conductive film having a good conductivity, and the fabrication cost is reduced. CONSTITUTION: A method is for fabricating a transparent conductive film by coating and annealing a transparent conductive composition material on a substrate. The material is quenched after thermal treatment. According to the method, a transparent conductive film is obtained which has an improved sheet resistance. Because the transparent conductive film maintains good sheet resistance although it is annealed at a lower temperature than the conventional annealing temperature, the energy needed in thermal treatment is reduced.
申请公布号 KR20000033390(A) 申请公布日期 2000.06.15
申请号 KR19980050234 申请日期 1998.11.23
申请人 SAMSUNG SDI CO., LTD. 发明人 PARK, SUNG SOON;KIM, KI YOUNG;LEE, JUNG JIN;CHUN, YOON HO
分类号 H01J9/20;(IPC1-7):H01J9/20 主分类号 H01J9/20
代理机构 代理人
主权项
地址