| 摘要 |
PURPOSE: A method for manufacturing an infrared bolometer is provided to obtain sacrificial layers which are deposited at room temperature and removed easily by etching. CONSTITUTION: A method for manufacturing an infrared bolometer comprises providing a substrate(212) with integrated circuits and a pair of contact pads(214), depositing a protection layer(216) covering the substrate(212) and contact pads(214), depositing a first sacrificial layer(301) on the protection layer(216), forming a support level(220) on the first sacrificial layer(301), depositing a second sacrificial layer(311) on the support level(220) at room temperature, forming an absorption layer(295) having bolometer elements(285) on the second sacrificial layer(311), and removing the first and second sacrificial layers(301, 311). The infrared bolometer is of 3-layer structure.
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