| 摘要 |
PURPOSE: A manufacturing method of a color filter for a photosensitive device is provided to remove the residual of photoresist on a metal layer by coating R, G, B photoresist without level difference, thereby preventing line junction defect and increasing the yield in manufacturing. CONSTITUTION: A metal layer(24) is formed on a Si-substrate(21) having a device isolation film(22) and unit pixels(23). Then, a protective film(25) is formed on the metal layer(24). Next, a first photoresist is coated and then a first color pattern(26) is formed and cured by exposing/developing the first photoresist using a first mask. Then, a second photoresist is coated on the protective film(25) and then a second color pattern(27) is formed and cured by exposing/developing the second photoresist using a second mask. Then, the protective film(25) is exposed by partially exposing and developing a third photoresist, and the metal layer(24) is exposed by etching the protective film(25). Finally, a third color pattern(28) is formed and cured.
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