Process for exposing a peripheral area of a wafer and a device for executing the process,申请号EP19970101723-传众专利搜索

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发明名称	Process for exposing a peripheral area of a wafer and a device for executing the process
摘要
申请公布号	EP0788032(B1)	申请公布日期	2000.06.14
申请号	EP19970101723	申请日期	1997.02.04
申请人	USHIODENKI KABUSHIKI KAISHA	发明人	SHIBUYA, ISAMU;MINOBE, TAKESHI;MIMURA, YOSHIKI
分类号	H01L21/68;G03F7/20;H01L21/027;(IPC1-7):G03F7/20	主分类号	H01L21/68
代理机构		代理人
主权项
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