发明名称 |
Methods and apparatus for scanning and focusing an ion beam |
摘要 |
Methods and apparatus are provided for scanning and focusing a charged particle beam, such as an ion beam. The apparatus includes a charged particle source for generating a charged particle beam, scan electrodes disposed on opposite sides of the charged particle beam and a postscan electrode disposed adjacent to the charged particle beam and downstream of the scan electrodes. A postscan voltage is applied to the postscan electrode. A scan voltage generator applies to the scan electrodes scan voltages for scanning the charged particle beam in a first direction. The scan voltages have negative DC voltage offsets which are preferably more negative than the postscan voltage. The charged particle beam is focused in a second direction orthogonal to the first direction. The invention may be used in an ion implanter to increase the ion beam current delivered to a target.
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申请公布号 |
US6075249(A) |
申请公布日期 |
2000.06.13 |
申请号 |
US19980100927 |
申请日期 |
1998.06.19 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
OLSON, JOSEPH C. |
分类号 |
H01J37/147;H01J37/317;(IPC1-7):H01J3/14;H01J3/26 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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