发明名称 BASIS SUCH AS CLOTH AND FILM, AND PRODUCTION THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a bulky and three-dimensionally patterned basis having uneven patterns on which a number of large or small strained foams (bubble shaped parts) are scattered or aggregated and crinkling patterns surrounded with the uneven patterns, which are shaped by effectively using properties that the raw material of the basis such as cloth shrinks by a heat treatment. SOLUTION: This basis has crinkling parts 4 along lines of a cloud form pattern formed by numbers of curved lines crossing each other in irregular directions, and uneven swollen parts 5 surrounded with the crinkling parts 4, which are formed by applying heat treatment, for example, numbers of parts of a raw material is parched by bringing flames close to them.
申请公布号 JP2000160469(A) 申请公布日期 2000.06.13
申请号 JP19980349344 申请日期 1998.11.24
申请人 URUMA MASAO 发明人 URUMA MASAO
分类号 D06C23/04;D06M10/00;(IPC1-7):D06C23/04 主分类号 D06C23/04
代理机构 代理人
主权项
地址