| 摘要 |
<p>PROBLEM TO BE SOLVED: To prepare a polishing fluid composition capable of improving polishing speed without causing surface defect on the surface of an polishing object and capable of reducing surface roughness by including (A) a chelating compound, (B) partially esterified and/or etherified compounds of polyhydric alcohol and (C) water. SOLUTION: This polishing fluid composition includes (A) a chelating compound (preferably an aminocarboxylic acid) or its salt, (B) partially esterified and/or etherified compounds of polyhydric alcohol (preferably a sucrose ester) and (C) water. The composition preferably includes (D) abrasive (abrasive grain such as alumina grain or silicon carbide one). The contents of the ingredients A, B and C are preferably 0.05-20 wt.% and 50-99.9 wt.% respectively. When the ingredient D is included, it is blended in an amount of 0.01-40 pts.wt. based on 100 pts.wt. of the weight of the composition comprising the ingredients A, B and C.</p> |
