发明名称 PARALLEL OPERATION CONSTRUCTION OF END FACE POLISHING PART IN END FACE POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent the whole polishing process from becoming impossible to operate even when either of circumferential face polishing devices are stopped and attain an efficient polishing work by arranging a pair of the circumferential face polishing devices in series on both sides of carried members setting them as the boundary. SOLUTION: An end face polishing part 50 is provided with two carried members 51, 52 continuously arranged on the central part in series in Y-direction and two articulated arms respectively capable of reciprocating in the Y-direction, and a pair of circumferential face polishing devices 53 opposite to each other on both side the two carried members 51, 52 setting them as the bundary and respectively arranged in series in the Y-direction. Further it is provided with a pair of wafer turn-over members transmitting wafers received at a wafer transfer part 21 to the circumferential face polishing devices 53. Even when the circumferential face polishing device 53 is stopped by any situation, by operating a pair of the circumferential face polishing devices 53, 53 on the opposite side, polishing of the wafers can be continued.
申请公布号 JP2000158281(A) 申请公布日期 2000.06.13
申请号 JP19980337655 申请日期 1998.11.27
申请人 SPEEDFAM-IPEC CO LTD 发明人 HAKOMORI SHUNJI
分类号 B23Q7/14;B24B5/02;(IPC1-7):B23Q7/14 主分类号 B23Q7/14
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