Process and device for measuring the oxygen potential in a silicon melt

摘要

A process for measuring the oxygen potential in a silicon melt uses an electrochemical potential probe which dips into the melt. The probe voltage is measured using this potential probe which is made of an SiO2 glass tube in which graphite is in direct contact with SiO2 glass. The graphite has a wire making contact with it at the graphite upper end. The probe is dipped into the silicon melt only to an extent such that the graphite/wire contact point contained in the SiO2 glass tube lies above the silicon melt.