发明名称 ELECTROLESS SILVER PLATING SOLUTION FOR ELECTRONIC PARTS
摘要 PROBLEM TO BE SOLVED: To obtain an electroless silver plating soln. for electronic parts having a migration preventive effect and by which the service life of a plating bath is prolonged. SOLUTION: This plating soln. consists of a silver salt, a fluoric surfactant and a pH buffer salt. Silver nitrate is used as the silver salt, and >=1 kind between succinimide and phthalimide is used as a silver complexing agent. The soln. contains 0.05-30 g/l silver ion, 0.1-200 g/l >=1 kind between succinimide and phthalimide and 0.01-10 g/l fluorine surfactant and further contains an inorg. acid, an org. acid or both as the pH buffer salt.
申请公布号 JP2000160350(A) 申请公布日期 2000.06.13
申请号 JP19980336067 申请日期 1998.11.26
申请人 NIPPON KOJUNDO KAGAKU KK 发明人 SERIZAWA SEIICHI;IGAWA MASAHIRO;TAKASAKI TAKAHARU
分类号 C23C18/42;(IPC1-7):C23C18/42 主分类号 C23C18/42
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