发明名称 DRY ETCHING
摘要 A metallic surface formed of copper, silver, gold, or one alloy selected from alloys containing as a main component at least one of these metals is etched by plasma of an etching gas containing at least nitrogen oxide while being reacted with the plasma, whereby making it possible to fine-process electrically conductive materials, heat-transfer materials and electric-contact materials consisting of an alloy containing as a main component copper, silver, gold or at least two of these metals.
申请公布号 WO0033370(A1) 申请公布日期 2000.06.08
申请号 WO1999JP06761 申请日期 1999.12.02
申请人 JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF NATIONAL RESEARCH INSTITUTE FOR METALS;JAPAN SCIENCE AND TECHNOLOGY CORPORATION;NAKATANI, ISAO 发明人 NAKATANI, ISAO
分类号 C23F4/00;H01L21/033;H01L21/3213;H01L21/768;(IPC1-7):H01L21/306;C23F1/12 主分类号 C23F4/00
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