PHOTORESIST STRIPPER AND METHOD OF STRIPPING

摘要

A photoresist stripper which makes it possible to completely strip a photoresist at low temperature in a short time and does not cause the precipitation of insolubles or the adhesion thereof to an object of treatment even when the object is rinsed with water after the stripping. The stripper comprises 10 to 100 wt.% of a pyrimidinone compound represented by general formula (I): (wherein R1 and R2 are each hydrogen or C1-C4 alkyl). An object of treatment is stripped of a photoresist by dipping the object in the above stripper, followed by, if necessary, the rinsing of the resulting object with water.