发明名称 |
QUARTZ GLASS JIG HAVING LARGE IRREGULARITIES ON THE SURFACE AND METHOD FOR PRODUCING THE SAME |
摘要 |
An object of the present invention is to provide a quartz glass jig free from microcracks in the oxide film formed by a CVD process and thelike even after rinsing for a plurality of times and which enables semiconductor products free from contamination due to the generation of particles. Another object of the present invention is to provide a production method thereof. The object above is accomplished by a quartz glass jig having large irregularities on the surface thereof, characterized in that said irregularities have a center line roughness Ra in the range of from 2 to 30 mu m, a maximum heigt Rmax in the range of from 10 to 150 mu m, and a width in the range of from 10 to 500 mu m, and by a method which comprises forming an inorganic thin film on the surface of a quartz glass jig free from microcracks and having fine irregularities on the surface thereof, and thereafter rinsing it a plurality of times. |
申请公布号 |
WO0032529(A1) |
申请公布日期 |
2000.06.08 |
申请号 |
WO1999EP09261 |
申请日期 |
1999.11.29 |
申请人 |
HERAEUS QUARZGLAS GMBH & CO. KG;SHIN-ETSU QUARTZ PRODUCTS CO., LTD.;INAKI, KYOICHI |
发明人 |
INAKI, KYOICHI |
分类号 |
H01L21/683;C03B20/00;C03C15/00;C03C17/02;C03C17/22;C03C17/245 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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