| 摘要 |
<p>Method of forming a two-piece hollow cathode sputter target assembly and the assembly formed thereby. The sputter target assembly includes an outer shell (12) defining an open chamber (33) having a substantially cylindrical side wall and composed of a relatively low purity material. A sputtering insert (14) includes a substantially cylindrical side wall and is concentrically received within, and bonded to, the outer shell (12). The sputtering material is composed of a relatively high purity metallic material as used for depositing a thin layer or film onto a desired substrate. The mating surfaces (48, 56) of the sputtering insert (14) form a sputtering surface which defines an open chamber (59) and mate with mating surfaces (24, 28) of the outer shell (12). A plug (68) having outer surface (70) is used during the preparation of the assembly so as to prevent deforming or collapsing of the outer shell (12) and sputtering insert (14). A top closure plate (72) during preparation of the assembly is later removed.</p> |
