| 发明名称 |
DUAL COLLIMATOR PHYSICAL-VAPOR DEPOSITION APPARATUS |
| 摘要 |
A dual collimation physical-vapor deposition apparatus (56) is disclosed in which the apparatus comprises a chamber (58), target assembly (64), substrate (66), a long throw collimator defined by the distance of sidewalls (60, 62), and a physical collimator (68). The long throw and physical collimators provide a dual collimator assembly to increase the collimation of sputtered atoms.
|
| 申请公布号 |
WO0008228(A9) |
申请公布日期 |
2000.06.08 |
| 申请号 |
WO1999US17549 |
申请日期 |
1999.08.04 |
| 申请人 |
CVC, INC. |
发明人 |
PARANJPE, AJIT;SCHWARTZ, PETER;KOOLS, JACQUES;SONG, KANG;HEIMANSON, DORIAN;MOSLEHI, MEHRDAD, M. |
| 分类号 |
C23C14/04;C23C14/22;C23C14/34;G11B5/31;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
