发明名称 Method and apparatus for fabricating single crystal
摘要 This invention relates to fabrication of a single crystal of a compound semiconductor according to the vertical Bridgman method which improves a recess in the interface between solid and melt and can obtain a stable yield of single crystal growth characterized in that a part for discharging the heat of a crucible to the outside in the radial direction is formed at least in a part in the circumferential direction of a heater part for controlling the interface between solid and melt in a heater which surrounds the crucible and a semiconductor melt is gradually solidified from a lower part to an upper part in the crucible while maintaining the interface between solid and melt in a saddle shape, thereby growing a single crystal.
申请公布号 GB2338909(B) 申请公布日期 2000.06.07
申请号 GB19990012194 申请日期 1999.05.25
申请人 * HITACHI CABLE LTD. 发明人 SEIJI * MIZUNIWA;KENYA * ITANI;MICHINORI * WACHI
分类号 C30B11/00;C30B29/42;H01L21/208 主分类号 C30B11/00
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