| 摘要 |
PROBLEM TO BE SOLVED: To almost uniformalize the feed quantity of a treating liquid per the unit surface area of a substrate over the whole surface of the substrate even when the substrate is large-sized. SOLUTION: The rotary substrate treating device is provided with a freely rotatable substrate rotary table 2, on which the substrate is placed horizontally, a treating liquid feed pipe 9 provided with plural nozzles 7a-7e in the axial direction and arranged above the substrate rotary table 2 and a rotary driving motor for rotating the substrate rotary table 2. The surface treatment of the substrate is performed by feeding the treating liquid from the nozzles 7a-7e toward the substrate 1 with the rotation of the substrate rotary table 2. In such rotary substrate treating device, the diameter of each nozzle 7a-7e is increased with the increase of the distance from the rotation center of the substrate 1. |
