发明名称 TECHNIQUE FOR ETCHING METAL OXIDE SURFACE AND MATERIAL OBTAINED BY USING SAME TECHNIQUE
摘要 PROBLEM TO BE SOLVED: To provide a surface etching technique completely different from conventional mechanical or physical polishing methods for metal oxides and complex oxides without using ball mills or mechanical polishing. SOLUTION: The surface of powder, compacted body, sintered body, single crystal or mixture of these of metal oxides or complex oxides is halogenated to produce metal halides such as aluminum chloride or complex metal halides including the above metal halides are used as a complexing agent to produce a gaseous complex with the metal halides produced on the surface of the metal oxides. The produced complex is removed by chemical gas phase transfer. In this way, the surface of various kinds of metal oxides are etched.
申请公布号 JP2000154007(A) 申请公布日期 2000.06.06
申请号 JP19980326405 申请日期 1998.11.17
申请人 ADACHI KINYA 发明人 ADACHI KINYA;OZAKI TETSUYA;MACHIDA KENICHI;MASUI TOSHIYUKI
分类号 C04B41/91;B01J23/10;C01B13/14;C01F17/00;C01G25/02;C23F1/12;C30B33/12;(IPC1-7):C01B13/14 主分类号 C04B41/91
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