发明名称 RADIATION SENSITIVE COMPOSITION FOR COLOR FILTER
摘要 <p>PROBLEM TO BE SOLVED: To provide a radiation sensitive composition for a color filter, which has excellent development property without occurring defect or stripping off of pixel pattern in developing stage and excellent mechanical strength after film-forming, and also gives a good pattern shape and further does not generate defective display such as image seizing in using for a display panel. SOLUTION: This radiation sensitive composition for a color filter contains a pigment A, an alkali soluble resin B, a multi functional monomer C, a photopolymerization initiator D and a solvent E, in which the pigment A is dispersed by a dispersing agent containing a compound having a urethane linkage.</p>
申请公布号 JP2000155209(A) 申请公布日期 2000.06.06
申请号 JP19980330686 申请日期 1998.11.20
申请人 JSR CORP 发明人 ABE SHIGERU;MIYAJI MASAAKI;AOYAMA SATOKO;KOYAMA TAKAYOSHI
分类号 G02B5/20;C08F2/44;C08K9/04;G03F7/039;(IPC1-7):G02B5/20 主分类号 G02B5/20
代理机构 代理人
主权项
地址